Nanofabrication service

Electron beam lithography

Using direct patterning, we are able to fabricate very high-resolution micron to nano-sized features on electron beam sensitive resists. We can produce device components in semiconductor or insulator materials and generate high-quality optical masks for photolithography. The E-beam can regularly achieve patterning of sub-micron features and its maskless lithography approach means a fast turnaround for multi-design modifications and intricate alignment processes.

The system is an ideal fabrication tool for basic to advanced nanoscale research activity. It is capable of patterning a writing field area of 1 mm x 1 mm in high resolution mode and has a maximum wafer size of 300 mm in diameter.